What is a sputter target

The sputtering technique is a very important branch for PVD .PVD stands for Physical Vapor Deposition. PVD Coating refers to a variety of thin film deposition techniques. The sputter target is a sputtering source that forms various functional thin films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions. To put it simply, the target is the target material bombarded by high-speed energetic particles. It is used in high-energy laser weapons. When lasers with different power densities, different output waveforms, and different wavelengths interact with different targets, they will produce different killing and damage. effect. For example: Evaporative magnetron sputtering coating is heating evaporation coating, aluminum film and so on. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.) to obtain different film systems (such as super-hard, wear-resistant, anti-corrosion alloy film, etc.)